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Zhang, T.W., Bates, S.W., and Dornfeld D.A. (2007), "Operational Energy Use of Plasmonic Imaging Lithography", Proceedings of the IEEE International Symposium on Electronics and Environment (ISEE), May.

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ABSTRACT:
Plasmonic imaging lithography (PIL) is a new direct-write lithograghy process based on disk drive technology. Using the benchmark of similarly scaled masked and maskless lithography processes, this paper evaluates the operational energy use of PIL, as a component of manufacturing and environmental impact analysis. This study serves two purposes: to inform the sustainable development of this emerging technology, and to identify PIL as most appropriate for prototyping or highly agile manufacturing of 11 or fewer wafers per design change.

SUGGESTED CITATION:
Teresa Zhang, Sarah W. Bates, and David Dornfeld, "Operational Energy Use of Plasmonic Imaging Lithography" (February 21, 2007). Laboratory for Manufacturing and Sustainability. Green Manufacturing Group. Paper zhang_07_1.
http://repositories.cdlib.org/lma/gmg/zhang_07_1